
SinMat Inc Profile last edited on: 11/19/17
CAGE: 1YK02
UEI: ----------
Business Identifier: Chemical mechanical planarization (CMP) processes for defect free surfaces Is this YOUR Company?
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Location Information
Location: Single
Congr. District: 03
County: Alachua
Congr. District: 03
County: Alachua
Public Profile
Sinmat, Inc. specializes in the development of chemical mechanical planarization (CMP) processes that smooth out rough topography and create defect free surfaces, which are critical in the manufacture of computer chips, LEDs and power devices. Sinmat's planarization technologies also enable the manufacture of advanced substrate materials used in military and other sectors of the economy. The company's planarization technologies are based on several proprietary chemical mechanical planarization (CMP) processes. Used widely in semiconductor advanced materials, Sinmat's CMP technology is enabled by its unique polishing slurries, which involve a unique mix of nanoparticles and chemicals that smooth out rough topography and create defect free surfaces in a rapid reliable and cost effective manner. This technology is a part of a rapidly growing $20B market.
Extent of SBIR involvement
Synopsis: Awardee Business Condition
Employee Range
15-19Revenue Range
1.5M-2MVC funded?
NoPublic/Private
Privately HeldStock Info
----IP Holdings
25-49Awards Distribution by Agency
Most Recent SBIR Projects
Year | Phase | Agency | Total Amount | |
---|---|---|---|---|
2016 | 1 | Army | $99,999 | |
Project Title: Novel Reactive Defect Reduction Polishing Technology for Scalable Production of ElectronicDiamond Wafers | ||||
2015 | 1 | DOE | $149,998 | |
Project Title: Novel Ultra-High Rate Finishing Processes for Production of 100 mm Epi-ready GaN Substrates | ||||
2014 | 2 | AF | $899,988 | |
Project Title: Novel Silicon Carbide Epitaxy Process for Dramatic Improvements to Material Characteristics, Cost, and Throughput | ||||
2014 | 2 | MDA | $999,989 | |
Project Title: Innovative Polishing Technology for Fabrication of High Performance Epi-ready GaSb Substrates | ||||
2013 | 2 | DOE | $1,099,704 | |
Project Title: Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle Detectors |
Key People / Management
Deepika Singh -- President
Arul C Arjunan
Marie Dufourg
Purushottam Kumar
Syamal Lahiri
Abhudaya Mishra
Rajiv K Singh -- Founder and CTO
Arul C Arjunan
Marie Dufourg
Purushottam Kumar
Syamal Lahiri
Abhudaya Mishra
Rajiv K Singh -- Founder and CTO
Company News
There are no news available.