SBIR-STTR Award

Innovative Polishing Technology for Fabrication of High Performance Epi-ready GaSb Substrates
Award last edited on: 2/10/2015

Sponsored Program
STTR
Awarding Agency
DOD : MDA
Total Award Amount
$999,989
Award Phase
2
Solicitation Topic Code
MDA12-T003
Principal Investigator
Rajiv K Singh

Company Information

SinMat Inc

1912 Nw 67th Place
Gainesville, FL 32653
   (352) 334-7270
   info@sinmat.com
   www.sinmat.com

Research Institution

----------

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2013
Phase I Amount
$99,994
Antimony containing III-V semiconducting compounds are particularly attractive for the fabrication of a wide variety of electronic and optoelectronic devices such as photo detectors operating in the long wave infrared wavelength (12-32µm) range. The production of epi quality GaSb wafers still remains one of the important problems for rapid commercialization of GaSb devices. Sinmat Inc. proposes a novel chemical mechanical smoothening and passivation process that is expected to lead to ultra-smooth (< 2é GaSb epi-ready passivated surface in a reliable consistent manner.

Keywords:
Gallium Antimonide, Gasb, Chemical Mechanical Smoothening, Passivation

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2014
Phase II Amount
$899,995
Antimony containing III-V semiconducting compounds are particularly attractive for the fabrication of a wide variety of electronic and optoelectronic devices such as photo detectors operating in the long wave infrared wavelength (12-32µm) range. The production of epi quality GaSb wafers still remains one of the important problems for rapid commercialization of GaSb devices. In Phase I effort, we successfully demonstrated a polishing process to significantly reduce surface roughness (< 2Å), eliminate sub-surface damage and form a passivated GaSb surface. In Phase II of this project we plan to further develop and optimize our polishing and passivation process for low cost, reliable fabrication of ultra-smooth (<2Å roughness), sub-surface damage-free, low TTV large size (upto 6") GaSb substrates. Epi-ready GaSb substrate will significantly improve the performance of long wave infrared detectors and other devices.

Keywords:
GaSb, Chemical mechanical polishing, passivation, sub-surface damage, epigrowth