
Novel Rapid Chemical Mechanical Polishing (CMP) Process for Fabrication of High Performance CVD Diamond Particle DetectorsAward last edited on: 12/23/2014
Sponsored Program
SBIRAwarding Agency
DOETotal Award Amount
$1,099,704Award Phase
2Solicitation Topic Code
-----Principal Investigator
Arul C ArjunanCompany Information
Phase I
Contract Number: N/AStart Date: 00/00/00 Completed: 00/00/00
Phase I year
2011Phase I Amount
$100,000Benefits:
The technology to fabricate ultra-smooth defect surfaces on diamond crystal will be beneficial to many applications in the field of X-ray physics, particle physics, and nuclear physics. The current and future upgrades of national and international facilities related to high energy physics, nuclear research facilities, nuclear radiators, and X-ray synchrotrons need diamond based detectors and optics. Additionally, ultra-smooth diamond substrates can also be used for heat dissipation in silicon based electronics.
Phase II
Contract Number: DE-FG02-12ER86520Start Date: 00/00/00 Completed: 00/00/00
Phase II year
2013Phase II Amount
$999,704Benefits:
The technology to fabricate ultra-smooth defect surfaces on diamond crystal will be beneficial to many applications in the field of X-ray physics, particle physics, and nuclear physics. The current and future upgrades of national and international facilities related to high energy physics, nuclear research facilities, nuclear radiators, and X-ray synchrotrons need diamond based detectors and optics. Additionally, ultra-smooth diamond substrates can also be used for heat dissipation in silicon based electronics.