In July 2004, AIXTRON, a German based supplier of MOCVD (metal-organic chemical vapor deposition) products for the production of light emitting diodes, chips and lasers, merged with Genus (Nasdaq:GGNS). Genus, Inc. (Nasdaq: GGNS) designs, manufactures and markets capital equipment and deposition processes for advanced semiconductor manufacturing as well as for other, emerging non-semiconductor applications. The firm offer various thin film deposition modules with their own production-proven platform- the LYNX2® for 200mm wafers and more recently, the LYNX3 for 300mm wafers. These systems deliver processes for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of conducting (metal) or insulating (dielectric) materials. The firm's core business has been in the area of tungsten-based thin films used in the development and manufacture of memory modules (DRAM) in the semiconductor industry. However our ALD technology is gaining attention and acceptance within and beyond the semiconductor industry. With precise control capabilities and conformal step coverage of difficult high-aspect ratios, our ALD technology promises to enable near-and next-generation geometries that continue to shrink in both the semiconductor world and other industries. In mid-2000, the company expanded marketing efforts for our ALD technology to new customers for a variety of applications beyond the memory segment of the semiconductor industry. By Q1 2001, penetration of the data storage industry for gap dielectric applications in disk drive recording heads. Additionally, purchase orders received for ALD systems for use in logic gate applications for both 200mm and 300mm platforms.
