
Broadband Excitation of ECR PlasmasAward last edited on: 2/27/2006
Sponsored Program
SBIRAwarding Agency
DOETotal Award Amount
$58,637Award Phase
1Solicitation Topic Code
-----Principal Investigator
Wayne D CorneliusCompany Information
Phase I
Contract Number: ----------Start Date: ---- Completed: ----
Phase I year
2005Phase I Amount
$58,637Commercial Applications and Other Benefits as described by the awardee:
The modified RF circuit could be marketed as a simple add-on device to improve ECR source operation. The cost of such a device would be relatively modest and could instantly and significantly improve the performance of virtually any ECR source in the world. The device also should find application in other ECR plasma systems such as sources of singly charged ions for ion implantation; in plasma etching systems used in semiconductor fabrication; and in light-ion sources used for proton therapy, isotope production, and other light-ion accelerator applications
Phase II
Contract Number: ----------Start Date: ---- Completed: ----