Company Profile

The patented Analytical System developed by Active Lyer Parametrics (ALP Inc.) is designed to detect activation and electrical characteristics of dopants and impurities in current technologically important materials. The system can provide electrical depth profiles over a depth range from a few angstroms (Å) to tens of microns (µm). The Active Layer Parametrics (ALP Inc.) system enables rapid and accurate measure mobility and activated carrier concentration profiles with Angstrom-level resolution for the semiconductor manufacturing industry. These profiles detail the depth of electrical activation due to implant-anneal recipes. with ALP perhaps the only system capable of doing these measurements on a routine basis. The goal of the company is to improve yield by quick feedback enabling devices to be made in minutes and to improve device performance by tracking process changes to electronic impact