SBIR-STTR Award

Thin crystalline technologies for advanced power transistors
Award last edited on: 9/22/2017

Sponsored Program
SBIR
Awarding Agency
NSF
Total Award Amount
$1,229,998
Award Phase
2
Solicitation Topic Code
S
Principal Investigator
Leo Mathew

Company Information

Applied Novel Devices (AKA: A.N.D. Inc)

15844 Garrison Circle
Austin, TX 78717
   (512) 775-7991
   N/A
   www.appliednoveldevices.com
Location: Single
Congr. District: 31
County: Williamson

Phase I

Contract Number: 1549353
Start Date: 1/1/2016    Completed: 6/30/2016
Phase I year
2016
Phase I Amount
$150,000
The broader impact/commercial potential of this Small Business Innovation Research (SBIR) Phase I project is to enable smaller chargers, power factor convertors and switches in applications ranging from small applications such as implanted pace-makers, mobile-phones, computer to large applications such as automobile, machinery to very large applications such as ships, locomotives, traditional and renewable energy power plants. While the impact of the power switching product to be developed using this technology in this phase II project is broad, the use of this thin crystalline technology can have even broader impact across all modern semiconductor devices such as LED, PV, flexible CMOS and passive devices. The project will potentially enable thin form-factor packages in this broad range of power electronics applications.

This Small Business Innovation Research (SBIR) Phase I project addresses challenges to further scaling of power MOSFETs which are one of the key building blocks of the electronic revolution we have witnessed over the last few decades. While the feature size of transistors has been constantly shrinking, the substrate thickness has been increasing. These substrates are currently mechanically thinned to minimize the negative impact of this increased thickness on performance and form-factor. There are significant challenges to continue this trend and the thin crystalline technology and device architecture proposed here can enable continued scaling of device metrics over the next decade with favorable cost structures. This effort will focus on the following specific technical challenges to bring it to market. (1) Develop power MOSFETs with improved switching characteristics using the thin crystalline technology (2) Develop the process technology on large area wafers used in current production lines (3) Develop the low-form factor package using the metallization features of thin-crystalline exfoliated technology (4) Characterize the device for performance and insertion into high volume de-risk (5) Develop a roadmap for a family of products that is sustainable over a decade to justify significant manufacturing investment to bring this technology to market.

Phase II

Contract Number: 1660078
Start Date: 4/1/2017    Completed: 3/31/2019
Phase II year
2017
(last award dollars: 2019)
Phase II Amount
$1,079,998

This Small Business Innovation Research (SBIR) Phase II project seeks to de-risk the volume manufacturability and reliability of thin crystalline power MOSFETs fabricated with a novel exfoliation technology demonstrated in Phase 1. The broader impact/commercial potential of this project is to enable lower cost and better performance for power devices in switching or transferring electricity under varying power requirements across the voltage spectrum in a variety of applications ranging from consumer, to communications, automotive and industrial applications. In all of these applications, the ON resistance of the power MOSFET and IGBTs can be reduced and the switching speed and performance further improved by reducing the device thickness. Additionally, in consumer and mobile applications, reducing the form factor of the power MOSFET devices can enable slimmer and lighter products. A significant broader impact of this technology will be the reduction of expensive and environmentally hazardous waste treatment processes associated with wafer grinding technology used in the power MOSFET industry. While the power MOSFETs developed using this technology can have broad commercial and societal impact, the use of this thin crystalline technology can have even broader impact across all modern semiconductor devices such as LED, PV, flexible CMOS and passive devices.This Small Business Innovation Research (SBIR) Phase I project addresses challenges to further scaling of Power MOSFETs which are one of the key building blocks of the electronic revolution over the last few decades. While the feature size of transistors has been constantly shrinking, the substrate thickness has been increasing. These substrates are currently mechanically thinned to minimize the negative impact of this increased thickness on performance and form-factor. There are significant challenges to continue this trend and the thin crystalline technology and device architecture proposed here can enable continued scaling of device metrics over the next decade with favorable cost structures. During phase I, functional power MOSFETs were demonstrated with this thin crystalline technology to establish the feasibility of this technology for power devices. This phase II effort will focus on the following specific technical challenges to bring it to market. (1) Develop power MOSFETs with improved switching characteristics using the thin crystalline technology (2) High voltage high current characterization of the thin crystalline power MOSFETs (3) Process yield and reliability characterization of package thin crystalline power MOSFET parts and (4) Convert existing process line to use thin crystalline exfoliation technology in high volume manufacturing flow.