
Thin crystalline technologies for advanced power transistorsAward last edited on: 9/22/2017
Sponsored Program
SBIRAwarding Agency
NSFTotal Award Amount
$1,229,998Award Phase
2Solicitation Topic Code
SPrincipal Investigator
Leo MathewCompany Information
Phase I
Contract Number: 1549353Start Date: 1/1/2016 Completed: 6/30/2016
Phase I year
2016Phase I Amount
$150,000This Small Business Innovation Research (SBIR) Phase I project addresses challenges to further scaling of power MOSFETs which are one of the key building blocks of the electronic revolution we have witnessed over the last few decades. While the feature size of transistors has been constantly shrinking, the substrate thickness has been increasing. These substrates are currently mechanically thinned to minimize the negative impact of this increased thickness on performance and form-factor. There are significant challenges to continue this trend and the thin crystalline technology and device architecture proposed here can enable continued scaling of device metrics over the next decade with favorable cost structures. This effort will focus on the following specific technical challenges to bring it to market. (1) Develop power MOSFETs with improved switching characteristics using the thin crystalline technology (2) Develop the process technology on large area wafers used in current production lines (3) Develop the low-form factor package using the metallization features of thin-crystalline exfoliated technology (4) Characterize the device for performance and insertion into high volume de-risk (5) Develop a roadmap for a family of products that is sustainable over a decade to justify significant manufacturing investment to bring this technology to market.
Phase II
Contract Number: 1660078Start Date: 4/1/2017 Completed: 3/31/2019
Phase II year
2017(last award dollars: 2019)