This Small Business Innovation Research Phase I project will provide the necessary precursor chemical kinetic and morphology optimization to produce thin films of yttria-stabilized-zirconia (YSZ) via an innovative, low-cost process called Pulsed-MOCVD. The Pulsed-MOCVD system utilizes liquid injection of metalorganic precursor into a low pressure chemical vapor deposition reactor. The problem is that deposition methods currently available to produce YSZ coatings with the required microstructure and properties are extremely expensive, highly polluting and energy intensive. The objective of the research is to determine the best precursor and optimal deposition conditions to produce the desired YSZ film on the target substrates with via Pulsed-MOCVD. The research will utilize an existing experimental system to measure the growth rate and efficiency over the entire deposition range for three promising types of precursors. The microstructure and crystallography of films grown under high-efficiency deposition conditions will be analyzed. The experimental data together with kinetic modeling and analysis of the morphology will result in the design criteria for a commercial application of the innovative technology. Potential applications of the results include the manufacture of corrosion resistant coatings, catalytic surfaces, solid oxide fuel cells (SOFCs) and thermal barrier coatings (TBCs).
