Sight Systems Inc. will develop a low cost, high speed critical dimension measurement tool for 0.18 m features in the IC and data storage industry. This tool takes advantage of an optical technique developed at the California Institute of Technology, that exploits the polarization properties of light diffracted by a subwavelength-sized structure. The cost per measurement of the tool developed will be less than one twelfth that of existing, competing SEM or AFM technologies.
