SBIR-STTR Award

Development of High Performance AlInN-Based HEMTs
Award last edited on: 10/29/2012

Sponsored Program
SBIR
Awarding Agency
DOD : MDA
Total Award Amount
$849,509
Award Phase
2
Solicitation Topic Code
MDA08-024
Principal Investigator
Oleg Laboutin

Company Information

Kopin Corporation

125 North Drive
Westboro, MA 01581
   (508) 870-5959
   cyberdisplay@kopin.com
   www.kopin.com
Location: Multiple
Congr. District: 02
County: Worcester

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
2009
Phase I Amount
$99,990
ransistors (HEMTs) by providing a strain-free alternative to AlGaN as the barrier material. In particular, AlInN lattice matched to GaN should exhibit significantly higher polarization-induced charge and drain current, resulting in enhanced high power and high frequency capabilities for GaN HEMTs. However, AlInN alloys are challenging materials to produce due to the difference in growth conditions between AlN and InN, and due to expected miscibility issues. Therefore, further development is required to realize high performance devices based on AlInN. This SBIR program will explore the optimization of AlInN for use in high power and high frequency GaN HEMTs.

Keywords:
Gan, Wide Band Gap Material, High Power Amplifiers, Reliability, Defects, Mocvd, Alinn, Hemt

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
2010
Phase II Amount
$749,519
The AlInN alloy lattice matched to GaN is predicted to improve the performance and reliability of GaN-based high electron mobility transistors (HEMTs) and monolithic microwave integrated circuits for military and commercial applications. High power and high frequency operation, along with high reliability, radiation and ESD resistance, are expected in discrete devices and integrated systems employing AlInN material. The most serious obstacle to the immediate utilization of AlInN in HEMT structures is the difficulty of its synthesis and device processing by the existing technologies. During Kopin’s Phase I effort, we achieved record high electron densities and electron mobility in our AlInN-based structures and demonstrated their potential for applications in high-performance transistors. In spite of this remarkable progress, further development on the synthesis and device processing of this material needs to be carried out for its transition to military product. During the Phase II effort Kopin will team up with industrial leaders in the design and manufacture of high-performance RF components to realize device quality AlInN-based structures and produce production prototype AlInN-based HEMT devices.

Keywords:
Gan, Alinn, Wide Band Gap Material, Mocvd, Reliability, Defects, Hemt, High Power Amplifiers