Fusion reactors require highspeed pumping of helium, deuterium, and tritium while maintaining the inventory of tritium in the pumps at a low level. Cryopumping is potentially the most attractive method for this task, but existing cryopump designs require that the pump be removed from service frequently and regenerated to prevent an excessive accumulation of tritium in the pump. For example, the International Thermonuclear Experimental Reactor (ITER) conceptual design calls for a twohour operating cycle: 80 minutes for pumping and 40 minutes for regeneration. This frequent regeneration requires cycling of large vacuum valves and cryogenic components that introduces inefficiencies and places a burden on the reliability of the system. The objective of this project is to develop a continuous compound cryopump that can meet ITER performance requirements without frequent cycling for regeneration and that will greatly reduce the tritium inventory in the pumping system. In Phase I, the feasibility of such a pumpwas shown by tests with an experimental cryosorption pump that demonstrated continuous pumping of argon, copumping of argon/hydrogen mixtures, and continuous pumping and regeneration of pure hydrogen on a CO2 frost. A conceptual design was made of a continuous pumping system for ITER. In Phase II a prototype of an ITER pump will be constructed and tested that will continuously pump and regenerate a deuterium/helium/impurity mixture and produce a separate, purifiedliquid stream suitable for the production of solid pellets to be reinjected into the plasma. The prototype pump will be suitable for testing at a DOE tritium facility in Phase III.Anticipated Results /Potential Commercial Applications as described by the awardee:This work should lead to a practical continuous cryosorption cryopump. Such a pump would be useful for contemporary and future fusion reactors, especially where continuous operation and low pumpinventory are important. A potential commercial application of this technology is for pumping of sputtering chambers for thinfilm metallization, a process used in microelectronics fabrication.