SBIR-STTR Award

Resists for 193 nanometer photolithography
Award last edited on: 1/9/2006

Sponsored Program
SBIR
Awarding Agency
DOD : DARPA
Total Award Amount
$49,950
Award Phase
1
Solicitation Topic Code
DARPA92-076
Principal Investigator
Michele Malitz

Company Information

Submicron Technology Corporation

674 W Lautrec Court
Thousand Oaks, CA 91360
   (310) 377-5232
   N/A
   N/A
Location: Single
Congr. District: 26
County: Ventura

Phase I

Contract Number: ----------
Start Date: ----    Completed: ----
Phase I year
1992
Phase I Amount
$49,950
Anticipated benefits/potential applications:Anticipated benefits for the federal government include the ability to allow manufacture of low-cost high-yield VLSI circuits for wide-spread DoD usage, and to allow fabrication of cost-effective military custom asic chips with features at or below 0.25 micron (using photolithography, e-beam or x-ray lithography). Potential commercial opportunities include going into large-scale production of the resist for submicron as well as sub-half-micron utilization.

Phase II

Contract Number: ----------
Start Date: ----    Completed: ----
Phase II year
----
Phase II Amount
----