SBIR-STTR Award

Sputter-Deposition Technology for Productivity of Low-Temperature Crystalline AI2O3 Films
Award last edited on: 7/18/13

Sponsored Program
SBIR
Awarding Agency
DOD : Army
Total Award Amount
$840,000
Award Phase
2
Solicitation Topic Code
A98-004
Principal Investigator
Abraham Belkind

Company Information

Abe Belkind & Associates

184 Martins Way
North Plainfield, NJ 07060
   (908) 769-6501
   abelkind@stevens-tech.edu
   N/A
Location: Single
Congr. District: 12
County: Union

Phase I

Contract Number: DAAE30-99-C-1031
Start Date: 12/22/98    Completed: 6/30/99
Phase I year
1999
Phase I Amount
$117,000
This Small Business Innovation Research Phase I project will prove the principle of using a new low temperature sputtering technique to deposit crystalline films of A1203 on substrates heated to <300 Cc. crystalline films of A1203 exhibit high corrosion and oxidation resistance. Acceptable films formed by conventional sputtering methods require substrate temperatures higher than 350 0C. Lowering substrate temperatures below 350 CC will allow coatings on aluminum and other temperature sensitive materials. We propose to use an unbalanced magnetron powered by synchronized pulsed power and pulsed biasing. This will result inan enhanced ion bombardment of growing films and production of hard, transparent, and environmentally stable oxide films - all at low substrate temperatures. The technology can be scaled up linearly for large area depositions. In Phase I, we will evaluate the technology, deposit A1203 films and characterize them. In Phase I Option, together witha collaborator and potential end-user, we will further optimize the deposition process, evaluate the films' mechanical, structural and environmental properties, and perform technology cost analysis. In Phase II, we will further refine the technology, by interacting with end users, and design and produce crystalline A1203 coatings with improved interface adhesion on various substrates. Phase III will consist of marketing the technology and processing services.

Benefits:
The proposed technology has the potential to 5ignificantly improve the existing A1203 film manufacturing technologies. Further, the materials focus of this effort could significantly impact the lifetime and performance of many existing and future coatings.

Phase II

Contract Number: DAAE30-00-C-1035
Start Date: 5/1/00    Completed: 5/1/02
Phase II year
2000
Phase II Amount
$723,000
This Small Business Innovation Research Phase II project is to develop of a new deposition technology based on a low temperature sputtering technique, introduced and investigated in Phase I. This technique deposits dense and crystalline films of Al2o3 at substrates temperatures not higher than about 350 C. Dense crystalline films of Al203 exhibit high corrosion and oxidation resistance, their implementation in protective coatings on aluminum is attractive and economically effective. We propose development of a deposition technology to coat three-dimensional aluminum parts having initially simple profile. The technology will implement a dual unbalanced magnetron system powered by a medium frequency pulsed power together with a synchronized pulsed biasing. The magnetrons will face each other creating a large-volume plasma in which various substrates will be immersed during deposition. The deposition system will be designed, assembled and tested and the deposition process will be further optimized. Together with a collaborator and potential endures, we will optimize the technology of making AlO based environmentally strong coatings on real-life aluminum parts. A prototype deposition system will be build and its commercialization will be evaluated. In Phase III, the deposition technology and deposition system will be brought to the market.

Benefits:
The proposed technology has the potential to significantly improve the existing Alo3 film manufacturing technologies. Further, the materials focus of this effort could significantly impact the lifetime and performance of many existing and future coatings.