SBIR-STTR Award

This Small Business Innovation Research Phase I research project will fabricate a new generation of relief-free thin-plate semiconductor components of diffraction optics and photonic crystals operating in the infrared spectral region up to wavelengths of about 10 micrometer. The holographic recording of the one-dimensional or two-dimensional sub-wavelength diffraction grating structures will be performed using an already demonstrated proprietary process, which dramatically changes the refractive index of the semiconductor material. The same process can be used for optical recording of various complicated phase structures projected on the semiconductor surface through a mask defining geometry of the structures. The possibility of employing the methods of physical holography for recording the volume phase holograms permit an automatic accounting for all particularities of each specific component with compensation of possible imperfections. The technology will permit fabrication of various relief-free sub-wavelength diffraction components based on semiconductor materials, including photonic crystals, diffraction gratings, spectral filters, polarizing beam splitters, retardation plates, lenses, effective medium optical components and anti-reflecting coatings. It will also allow manufacturing of sub-wavelength diffraction components operating in the mid-infrared (mid-IR) and long-wave infrared (LWIR) regions of the spectrum

"This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." This Small Business Innovation Research (SBIR) Phase II project will develop a new generation of relief-free thin-plate components of diffractive optics operating in the infrared region of spectrum. The diffractive optics employs volume phase holographic structures, which are optically recorded in semiconductor materials transparent at the infrared wavelengths using proprietary process of photo-modification for producing dramatic change of the material refractive index under illumination with low intensity light. Phase I of this project proved feasibility of the proposed concept by demonstrating photo modification of ZnSe infrared material and fabricating the first model components. The developed technology can be immediately applied to fabrication of diffractive optics, volume phase holographic gratings, and phase retardation plates for wavelengths up to 1.9 ìm, as well as antireflection layers for wavelengths up to 8 ìm. In Phase II project the technology will be optimized and applied to fabrication of the prototype components of infrared diffractive optics operating at longer wavelengths, including the important wavelength of CO2 laser 10.6 ìm and windows of atmospheric transparency 3-5 and 8-12 ìm. The developed photo-modification process is highly adaptable and creates a rich technology platform for fabrication of a broad range of products for a large variety of markets. Successful implementation of this technology will result in a new generation of high efficiency relief-free infrared diffractive optics and sub-wavelength components, including diffraction gratings, beam splitters, beam shapers, semiconductor materials with artificial birefringence, phase retardation plates and wave plates. The relief-free components of infrared diffractive optics based on semiconductor materials are capable to withstand high light intensities and perform complicated light management functions. Another important application is the fabrication of highly stable anti-reflection (AR) layers on infrared semiconductor optics. The market for infrared diffractive optics includes defense and airspace industry, laser industry, spectral devices, sensors and detectors, night vision optics, industrial process control, material processing, cutting and welding, environmental monitoring, medical diagnostics and surgery