
Sub-Wavelength Lithography Employing Phase MasksAward last edited on: 4/3/2008
Sponsored Program
SBIRAwarding Agency
DOD : DARPATotal Award Amount
$848,950Award Phase
2Solicitation Topic Code
SB031-004Principal Investigator
Daniel AbramsCompany Information
Luminescent Technologies Inc
2471 East Bayshore Road Suite 600
Palo Alto, CA 94303
Palo Alto, CA 94303
(650) 433-1060 |
info@luminescent.com |
www.luminescent.com |
Location: Single
Congr. District: 18
County: Santa Clara
Congr. District: 18
County: Santa Clara
Phase I
Contract Number: ----------Start Date: ---- Completed: ----
Phase I year
2003Phase I Amount
$138,950Phase II
Contract Number: ----------Start Date: ---- Completed: ----
Phase II year
2004Phase II Amount
$710,000Keywords:
PHASE MASKS, LITHOGRAPHY, INVERSE PROBLEM, NANOTECHNOLOGY, SEMICONDUCTORS, SUB-WAVELENGTH, EDA, PHOTOMASK