The evolution of VLSIC technology further demands innovative and fast submicron lithography which could replicate more densely packed IC at a high throughput. The proposed Hypocycloidal Pinch (HCP) light source is considered to be an intense x-ray source suitable for submicron and high throughput lithography. This device has a novel geometry which utilizes the plasma dynamics hypocycloidally pinched into the radial direction and eventually resulting in a very stable, high energy, and highly dense plasma in its axial center.The emission spectra from this highly compressed and stable plasma is composed mainly of a waveband of intense soft x-ray. The size of pinched plasma is so small in diameter that the penumbra effect can be also minimized in the photo-lithography. This stable and highly compressed plasma guarantees the reproducibility of the soft x-ray emission and its intense emission ensures the fast throughtput. The proposed HCP soft x-ray light source is an inexpensive system, so that it is ideal for the small business entities and university laboratories.Commercial Applications:Semiconductor industries require high density design and fabrication. Soft x-ray light source will provide fine line resolution for submicron photo lithographic applications.
