Date: May 15, 2013 Author: Douglas Resnick Source: 2013 SBIR National Conference
The Jet and Flash Imprint Lithography (J-FILTM) process uses drop dispensing of UV curable resists to assist high resolution patterning for subsequent dry etch pattern transfer. The technology is actively being used to develop solutions for memory markets including Flash memory and patterned media for hard disk drives. In this work, we propose a scalable roll-based nanoimprinting process. If successful, the potential applications include thin film transistors, flexible and rigid displays, wire grid polarizers, smart windows, color filters, solar devices, biomedical sensors and nanodrug delivery systems.
In order to scale the technology for high volume manufacturing, we propose a three phase model:
1.Successful demonstration of a roll-based technology demonstrator platform, funded through an STTR Phase 1 program: - Completed September 2011:
2.Initial scale-up of a prototype system capable of patterning either flexible or rigid substrates up to a width of 330mm, funded through an STTR Phase II program: - Funding awarded in August 2012. Program start in 1Q2013.
3.Development agreement with a strategic partner(s) designed to address their particular market need. The outcome of the development agreement would be a high volume manufacturing roll-based J-FIL platform. - Targeted outcome of this proposal.
